Tailoring spectral position and width of field enhancement by focused ion-beam patterning of plasmonic nanoparticles

Search Swinburne Research Bank

Home

List of Titles

Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.3/147931

Check Swinburne's subscriptions for full text availability

Title: Tailoring spectral position and width of field enhancement by focused ion-beam patterning of plasmonic nanoparticles
Author(s): Rosa, Lorenzo; Sun, Kai; Szymanska, Joanna; Hudson, Fay E.; Dzurak, Andrew; Linden, Andre; Bauerdick, Sven; Peto, Lloyd; Juodkazis, Saulius
Abstract: We propose to use ion-beam patterning of plasmonic nanoparticles made by standard electron beam lithography, plasmonic metal deposition, and lift-off sequence. With this approach new three-dimensional (3D) tailoring of nanoparticles becomes possible: cut through the particle and into the substrate, cut-through at an angle, trim or bore nanoparticles or substrate. Here, we numerically simulate the expected optical properties of such 3D patterned nanoparticles. We show a particular case when spectrally broad extinction band can be created with a strong light field enhancement on a Si substrate. Nanoparticles with a 10-20 nm nano-gap cut by ion-beam at the chosen location and to the required depth into the substrate. Scanning electron microscopy (SEM) image of the fabricated Au-nanoparticles.
Publication type: Journal article
Research centre: Swinburne University of Technology. Faculty of Engineering and Industrial Sciences. Centre for Micro-Photonics
Source: Physica Status Solidi: Rapid Research Letters, Vol. 4, no. 10 (Oct 2010), pp. 262-264
Publication year: 2010
FOR Code(s): 01 Mathematical Sciences; 02 Physical Sciences; 09 Engineering
Keyword(s): Electron beam lithography; Ion beam lithography; Light field enhancement; Nanoparticles; Patterning; Plasmonics
Publisher: WILEY-VCH Verlag GmbH & Co. KGaA
ISSN: 1862-6254
Publisher URL: http://dx.doi.org/10.1002/pssr.201004239
Peer reviewed