Fabrication of Si thin films from chlorinated materials utilizing high pressure microwave plasma

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Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.3/149901

Title: Fabrication of Si thin films from chlorinated materials utilizing high pressure microwave plasma
Author(s): Saha, Jhantu Kumar; Ohse, Naoyuki; Kazu, Hamada; Kobayashi, Tomohiro; Shirai, Hajime
Abstract: Abstract not available.
Publication type: Conference paper
Source: Extended abstracts of the 54th Spring Meeting of the Japan Society of Applied Physics and Related Societies, Aoyama Gakuin University, Tokyo, Japan, 27-30 March 2007, Paper no. M2
Publication year: 2007
Keyword(s): Chlorine; Microwave plasma; Silicon; Thin films
Publisher: Japan Society of Applied Physics
Publisher URL: http://www.jsap.or.jp/english/meeting-events/annualmeeting.html