Fabrication and characterization of SiC films deposited by Gas tunnel type plasma spraying

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Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.3/154519

Title: Fabrication and characterization of SiC films deposited by Gas tunnel type plasma spraying
Author(s): Fahim, N. F.; Kobayashi, A.
Abstract: Abstract not available.
Publication type: Conference paper
Source: Paper presented at the High Temperature Society of Japan Meeting, Osaka, Japan, 07 December 2005
Publication year: 2005
Keyword(s): Gas tunnel type plasma spraying; SiC films; Silicon carbide
Publisher: High Temperature Society of Japan
Publisher URL: http://www.amps.or.jp/