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Title

Laser-induced microexplosion confined in a bulk of silica: Formation of nanovoids

Author(s)

Juodkazis, Saulius;  Misawa, Hiroaki;  Hashimoto, Tomohiro;  Gamaly, Eugene G.;  Luther-Davies, Barry

Abstract

We report on the nanovoid formation inside synthetic silica, viosil, by single femtosecond pulses of 30-100 nJ energy, 800 nm wavelength, and 180 fs duration. It is demonstrated that the void is formed as a result of shock and rarefaction waves at pulse power much lower than the threshold of self-focusing. The shock-compressed region around the nanovoid is demonstrated to have higher chemical reactivity. This was used to reveal the extent of the shock-compressed region by wet etching. Application potential of nanostructuring of dielectrics is discussed.

Publication type

Journal article

Source

Applied Physics Letters, Vol. 88, no. 20 (May 2006), article no. 201909

Publication year

2006

FOR Code(s)

01 Mathematical Sciences;  02 Physical Sciences;  09 Engineering

Keyword(s)

Chemical reactions;  Dielectric materials;  Etching;  Laser-induced microexplosion;  Nanostructured materials;  Nanovoids;  Shock waves;  Silica;  Synthetic silica

Publisher

American Institute of Physics

ISSN

0003-6951

Publisher URL

http://dx.doi.org/10.1063/1.2204847

Copyright

Copyright © 2006 American Institute of Physics. The published version is reproduced with the kind permission of the publisher.

Full text

Peer reviewed