Two-photon lithography of nanorods in SU-8 photoresist

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Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.3/155895

Title: Two-photon lithography of nanorods in SU-8 photoresist
Author(s): Juodkazis, Saulius; Mizeikis, Vygantas; Seet, Kock Khuen; Miwa, Masafumi; Misawa, Hiroaki
Abstract: Studies on two-photon lithography in negative SU-8 photoresist demonstrate the possibility of obtaining mechanically stable, stress-free, extended nanorods having lateral sizes of about 30 nm (corresponding to λ/25 resolution). The high resolution achievable with the given combination of materials and fabrication techniques demonstrates its potential for the fabrication of large-scale nanostructures, such as photonic crystals with photonic stop gaps at visible wavelengths.
Publication type: Journal article
Source: Nanotechnology, Vol. 16, no. 6 (Jun 2005), pp. 846-849
Publication year: 2005
FOR Code(s): 0202 Atomic, Molecular, Nuclear, Particle and Plasma Physics; 0904 Chemical Engineering; 1007 Nanotechnology
Keyword(s): Electric potential; Glass; Laser pulses; Light absorption; Light propagation; Nanorods; Nanostructured materials; Photolithography; Photonic crystals; Photons; Photopolymerization; Photoresists; Piezoelectric transducers; Refractive index; Scanning electron microscopy; SU-8 photoresist; Two-photon lithography
Publisher: Institute of Physics Publishing
ISSN: 0957-4484
Publisher URL: http://dx.doi.org/10.1088/0957-4484/16/6/039
Peer reviewed