Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.3/189422

Download PDF (Published version) (Adobe Acrobat PDF, -1 bytes)

Title

Sculpturing of photonic crystals by ion beam lithography: towards complete photonic bandgap at visible wavelengths

Author(s)

Juodkazis, Saulius;  Rosa, Lorenzo;  Bauerdick, Sven;  Peto, Lloyd;  El-Ganainy, Ramy;  John, Sajeev

Abstract

Three dimensional (3D) ion beam lithography (IBL) is used to directly pattern 3D photonic crystal (PhC) structures in crystalline titania. The process is maskless and direct write. The slanted pore 3D structures with pore diameters of 100 nm having aspect ratio of 8 were formed. It is shown that chemical enhancement of titania removal up to 5.2 times is possible in XeF2 gas for the closest nozzle-to-sample distance; the enhancement was ∼ 1.5 times for the actual 3D patterning due to a sample tilt. Tolerances of structural parameters and optimization of IBL processing required for the fabrication of PhCs with full photonic bandgap in visible spectral range in rutile are outlined. Application potential of 3D-IBL is discussed.

Publication type

Journal article

Research centre

Swinburne University of Technology. Faculty of Engineering and Industrial Sciences. Centre for Micro-Photonics

Source

Optics Express, Vol. 19, no. 7 (Mar 2011), pp. 5802-5810

Publication year

2011

FOR Code(s)

0205 Optical Physics;  0903 Biomedical Engineering;  1113 Ophthalmology and Optometry

Keyword(s)

Bandgaps;  Ion beam lithography;  Photonic crystals;  Wavelengths

Publisher

Optical Society of America

ISSN

1094-4087

Publisher URL

http://dx.doi.org/10.1364/OE.19.005802

Copyright

Copyright © 2011 Optical Society of America. Published version of the paper reproduced here in accordance with the copyright policy of the publisher. This paper was published in Optics Express and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://dx.doi.org/10.1364/OE.19.005802. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.

Full text

Peer reviewed