Optical techniques for three-dimensional micro- and nanostructuring of transparent and photo-sensitive materials are reviewed with emphasis on methods of manipulation of the optical field, such as beam focusing, the use of ultrashort pulses, and plasmonic and near-field effects. The linear and nonlinear optical response of materials to classical optical fields as well as exploitation of the advantages of quantum lithography are discussed.
Advances in Polymer Science: Photoresponsive Polymers I,
Vol. 213 (2008), pp. 157-206