Three-dimensional structuring of resists and resins by direct laser writing and holographic recording

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Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.3/193113

Title: Three-dimensional structuring of resists and resins by direct laser writing and holographic recording
Author(s): Juodkazis, Saulius; Mizeikis, Vygantas; Misawa, Hiroaki
Abstract: Optical techniques for three-dimensional micro- and nanostructuring of transparent and photo-sensitive materials are reviewed with emphasis on methods of manipulation of the optical field, such as beam focusing, the use of ultrashort pulses, and plasmonic and near-field effects. The linear and nonlinear optical response of materials to classical optical fields as well as exploitation of the advantages of quantum lithography are discussed.
Publication type: Journal article
Source: Advances in Polymer Science: Photoresponsive Polymers I, Vol. 213 (2008), pp. 157-206
Publication year: 2008
FOR Code(s): 0303 Macromolecular and Materials Chemistry; 0912 Materials Engineering
Keyword(s): Laser lithography; Optical nonlinearities; Optical structuring; Photopolymerization; Quantum lithography
Publisher: Springer
ISSN: 0065-3195 (series ISSN)
ISBN: 9783540694489, 354069448X
Publisher URL: http://dx.doi.org/10.1007/12_2007_122
Peer reviewed