Three-dimensional high-aspect-ratio recording in resist

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Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.3/193382

Title: Three-dimensional high-aspect-ratio recording in resist
Author(s): Kondo, Toshiaki; Juodkazis, Saulius; Mizeikis, Vygantas; Misawa, Hiroaki
Abstract: We demonstrate a method of capillary force reduction during wet processing of three-dimensional structures photo-polymerized in resist by femtosecond pulses. A rinse in water was added as the final step of wet processing for recovery of free-standing photo-polymerized structures with feature sizes of ∼100 nm. The hydrophobicity of resist was utilized for reduction of the capillary drainage force. We show a possibility of holographical recording of a three-dimensional woodpile structure, which has a good permeability and can be fabricated by the proposed modified wet processing.
Publication type: Journal article
Source: Journal of Non-Crystalline Solids, Vol. 354, no. 12-13 (Feb 2008), pp. 1194-1197
Publication year: 2008
FOR Code(s): 0912 Materials Engineering
Keyword(s): Mechanical stress relaxation; Photonic bandgap; Strength; Structural relaxation
Publisher: Elsevier
ISSN: 0022-3093
Publisher URL: http://dx.doi.org/10.1016/j.jnoncrysol.2006.11.048
Peer reviewed