Search Swinburne Research Bank
This object has not yet been indexed by the background indexing service.
Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.3/204905
|Download PDF (Published version) (Adobe Acrobat PDF, -1 bytes)|
- High-photosensitive resin for super-resolution direct-laser-writing based on photoinhibited polymerization
- Cao, Yaoyu; Gan, Zongsong; Jia, Baohua; Evans, Richard A.; Gu, Min
- An ethoxylated bis-phenol-A dimethacrylate based photoresin BPE-100 of relatively high photosensitivity and modulus is used for the creation of sub-50 nm features. This is achieved by using the direct laser writing technique based on the single-photon photoinhibited polymerization. The super-resolution feature is realized by overlapping two laser beams of different wavelengths to enable the wavelength-controlled activation of photoinitiating and photoinhibiting processes in the polymerization. The increased photosensitivity of the photoresin promotes a fast curing speed and enhances the photopolymerization efficiency. Using the photoresin BPE-100, we achieve 40 nm dots for the first time in the super-resolution fabrication technique based on the photoinhibited polymerization, and a minimum linewidth of 130 nm. The influence of the power of the inhibiting laser and the exposure time on the feature size is studied and the results agree well with the prediction obtained from a simulation based on a non-steady-state kinetic model.
- Publication type
- Journal article
- Research centre
- Swinburne University of Technology. Faculty of Engineering and Industrial Sciences. Centre for Micro-Photonics
- Optics Express, Vol. 19, no. 20 (Sep 2011), pp. 19486-19494
- Publication year
- Optical Society of America
- Publisher URL
- Copyright © 2011 Optical Society of America. The published version of the paper is reproduced here in accordance with the copyright policy of the publisher. This paper was published in Optics Express and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://dx.doi.org/10.1364/OE.19.019486. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.