Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.3/214873

Title

Photo-electrochemical deposition of platinum on TiO2 with resolution of twenty nanometers using a mask elaborated with electron-beam lithography

Author(s)

Juodkazis, Saulius;  Yamaguchi, Akira;  Ishii, Hidekazu;  Matsuo, Shigeki;  Takagi, Hitoshi;  Misawa, Hiroaki

Abstract

We report the patterning of Pt on a TiO2-rutile single crystal (the fundamental absorption band starts at 396 nm) by direct deposition from a water solution of H2PtCl6 (10–20 mmol/dm3) using laser beam writing at 390–396 nm, or by Hg-lamp illumination (i-line at 365 nm). Pt deposition was corroborated by microchemical analysis. A resolution of the Pt patterning down to 20-30 nm was achieved. To create a Pt pattern with resolution of twenty nanometers, we employed a mask elaborated with electron-beam (EB) drawing lithography. The mask was transparent to the writing illumination. The Pt was reduced from the solution by laser beam scanning over resist-covered regions, while the pattern was formed in the openings of the resist. Separation of the growth and illumination regions, typically, by 0.5–2 µm, facilitates the deposition of reproducible, high-aspect ratio patterns. It is demonstrated that Pt was deposited through a process of diffusion of the light-excited carriers. The possibility of fabrication of a three-dimensional Pt pattern by the overgrowth of the resist is discussed.

Publication type

Journal article

Source

Japanese Journal of Applied Physics: Part 1: Regular Papers, Short Notes and Review Papers, Vol. 40, no. 6A (Jun 2001), pp. 4246-4251

Publication year

2001

FOR Code(s)

01 Mathematical Sciences;  02 Physical Sciences

Keyword(s)

Laser-assisted deposition;  Microfabrication;  Platinum;  Titania

Publisher

Japan Society of Applied Physics

ISSN

0021-4922

Publisher URL

http://dx.doi.org/10.1143/JJAP.40.4246

Copyright

Copyright © 2001 The Japan Society of Applied Physics.

Peer reviewed