Application of Bessel beams for microfabrication of dielectrics by femtosecond laser

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Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.3/214890

Title: Application of Bessel beams for microfabrication of dielectrics by femtosecond laser
Author(s): Marcinkevicius, Andrius; Juodkazis, Saulius; Matsuo, Shigeki; Mizeikis, Vygantas; Misawa, Hiroaki
Abstract: We demonstrate a novel approach to femtosecond microfabrication of transparent dielectrics, which employs nondiffracting Bessel beams instead of the conventionally used Gaussian beams. The main advantage of Bessel beams is the possibility of recording linear photomodified tracks, extending along the lines of nondiffractive beam propagation without sample translation, as would be required for Gaussian beams. Recording of patterns with an aspect ratio of up to 10(2)-10(3) in vitreous silica using amplified femtosecond Ti:saphire laser pulses is demonstrated.
Publication type: Journal article
Source: Japanese Journal of Applied Physics: Part 2: Letters and Express Letters, Vol. 40, no. 11A (Nov 2001), pp. L1197-L1199
Publication year: 2001
FOR Code(s): 01 Mathematical Sciences; 02 Physical Sciences
Keyword(s): Bessel beam; Laser-induced breakdown; Laser materials processing; Ultrafast phenomena; Vitreous silica
Publisher: Japan Society of Applied Physics
ISSN: 0021-4922
Publisher URL: http://dx.doi.org/10.1143/JJAP.40.L1197