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Title

Microfabrication by femtosecond laser irradiation

Author(s)

Misawa, Hiroaki;  Sun, Hong-Bo;  Juodkazis, Saulius;  Watanabe, Mitsuru;  Matsuo, Shigeki

Abstract

Femtosecond (fs) laser microfabrication has been gathering more research interests due to its ability to create micro- and sub-micrometer three-dimensional (3D) structures. An extremely high light intensity (—TW/cm2) enables multiphoton absorption (MPA) in transparent materials, upon which the spatial resolution of fabricated elements is confined to the sizes even smaller than optical diffraction limit. Our report will formulate the principles of the laser microfabrication of such applications. A direct application of single-shot pulse induced optical damage is a 3D optical memory with a storage density of ca. 100 Gbits/cm2 in silica. Photonic and optoelectronic applications such as optical gratings, 3D inlayed-'atom'-like and 2D cylinder-consisted photonic crystals have been fabricated in silica. Also, photopolymerization of photoresist by a scanning of focal point of laser irradiation solidifies submicrometer rods, which forms photonic lattices when packed into welldefined 3D pattern. Photonic bandgap effects (at 2—4 rim) of above-mentioned structures were corroborated by infrared Fourier spectroscopy and numerical simulations, by which the success of laser microfabrication was evidenced. Self-focusing of fs-pulses (optical Kerr effect) is another possibility of the microstructuring of transparent materials, which is demonstrated in the case of silica. This could find its application in sub-diffraction-limited recording.

Publication type

Conference paper

Source

Proceedings of SPIE: Laser Applications in Microelectronic and Optoelectronic Manufacturing V, San Jose, United States, 24-26 January 2000 / Henry Helvajian, Koji Sugioka, Malcolm C. Gower and Jan J. Dubowski (eds.), Vol. 3933, pp. 246-260

Publication year

2000

Keyword(s)

3D optical memory;  Laser microfabrication;  Multi-photon absorption;  Photonic crystals;  Resin;  Self-focusing;  Silica;  Two-photon absorption

Publisher

SPIE

ISSN

0277-786X (series ISSN)

ISBN

9780819435507, 0819435503

Publisher URL

http://dx.doi.org/10.1117/12.387561

Copyright

Copyright © 2000 Society of Photo-Optical Instrumentation Engineers. This paper was originally published in Proceedings of SPIE (Vol. 3933), and is available from: http://dx.doi.org/10.1117/12.387561. The published version of the paper is reproduced here in accordance with the copyright policy of the publisher. One print or electronic copy may be made for personal use only. Systematic electronic or print reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.

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