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Application of femtosecond Bessel-Gauss beam in microstructuring of transparent materials
List of Titles
Application of femtosecond Bessel-Gauss beam in microstructuring of transparent materials
Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.3/215047
- Title
- Application of femtosecond Bessel-Gauss beam in microstructuring of transparent materials
- Author(s)
- Marcinkevieius, Andrius; Juodkazis, Saulius; Mizeikis, Vygantas; Matsuo, Shigeki; Misawa, Hiroaki
- Abstract
- We demonstrate a new technique for femtosecond microfabrication in transparent dielectrics, which employs non-diffracting Bessel-Gauss beams instead of commonly used Gaussian beams. The main advantage achieved this way is the ability to record linear photomodified tracks, extending along the line of non-diffracting beam propagation without sample translation, as would be required for Gaussian beams. The initial near infrared Gaussian laser beam was transformed into the non-diffracting Bessel-Gauss beam by a glass axicon (apex angle 160 deg). The beam was imaged into the bulk of the sample by a telescope consisting of two positive lenses, which allowed to vary the focusing cone angle from 5 degrees to 19 degrees, and maximum non-diffracting propagation distance up to 1 cm. We have recorded pre-programmed patterns of multi-shot damage tracks (diameter about 3 mum), extended uniformly along the z-axis by varying the damage spot coordinates in the x - y plane. The experiments were carried out in various transparent dielectrics: silica glass, sapphire, and plexyglass. Physical processes underlying the Gauss-Bessel microfabrication, and its potential applications for stereolithography, 3D microstructuring, and photonic crystal fabrication will be discussed.
- Publication type
- Conference paper
- Source
- Proceedings of SPIE: Optical Pulse and Beam Propagation III, San Jose, United States, 24-25 January 2001 / Yehuda B. Band (ed.), Vol. 4271, pp. 150-158
- Publication year
- 2001
- Keyword(s)
- Axicon; Bessel-Gauss beam; Femtosecond laser microfabrication; Light-induced damage threshold
- Publisher
- SPIE
- ISBN
- 0277-786X
- Publisher URL
- http://dx.doi.org/10.1117/12.424689
- Copyright
- Copyright © 2001 Society of Photo-Optical Instrumentation Engineers. This paper was originally published in Proceedings of SPIE (Vol. 4271), and is available from: http://dx.doi.org/10.1117/12.424689. The published version of the paper is reproduced here in accordance with the copyright policy of the publisher. One print or electronic copy may be made for personal use only. Systematic electronic or print reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
- Full text

- Peer reviewed


