Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.3/221563

Download PDF (Published version) (Adobe Acrobat PDF, -1 bytes)

Title

Thermal and optical properties of sol-gel and SU-8 resists

Author(s)

Suzuki, Toshiyuki;  Morikawa, Junko;  Hashimoto, Toshimasa;  Buividas, Ricardas;  Gervinskas, Gediminas;  Paipulas, Domas;  Malinauskas, Mangirdas;  Mizeikis, Vygantas;  Juodkazis, Saulius

Abstract

We report on a combined differential scanning calorimetric (DSC) and Raman scattering study of thermal polymerization of sol-gel organic-inorganic SZ2080 and SU-8 resists. In SZ2080, endothermic peak at 95°C signify drying of the resist and justifies the required pre-bake at around 100°C for 1-2 h for the best performance during femtosecond (fs-)direct laser writing. A strong exothermic peak at 140°C (under 2 K/min heating rate) completes polymerization of the resist. It is revealed that 1wt% of photoinitiators change Raman scattering intensity of SZ2080 and can contribute efficiently to heating and cross-linking of photo-polymers. In the case of SU-8, a 65°C DSC feature related to solvent evaporation was observed. The strongest changes in Raman spectrum occurs at a narrow 895 cm-1 band which is linked to polymerization. Raman scattering taken during DSC revealed spectral changes following the polymerization; an applicability of this method for monitoring photopolymerization induced by ultra-fast laser sources and feasibility of a laser-modulated calorimetry is discussed.

Publication type

Conference paper

Research centre

Swinburne University of Technology. Faculty of Engineering and Industrial Sciences. Centre for Micro-Photonics

Source

Proceedings of the SPIE Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V Conference, San Francisco, California, United States, 24-25 January 2012 / Winston V. Schoenfeld, Raymond C. Rumpf, Georg von Freymann (eds.), Vol. 8249, article no. 82490K

Publication year

2012

Keyword(s)

Differential scanning calorimetry;  Local temperatures;  Photo-resists;  Polymerization mechanisms;  Raman scattering

Publisher

SPIE

ISSN

0277-786X (series ISSN)

ISBN

9780819488923, 0819488925

Publisher URL

http://dx.doi.org/10.1117/12.907028

Copyright

Copyright © 2012 Society of Photo-Optical Instrumentation Engineers. This paper was originally published in Proceedings of SPIE (Vol. 8249), and is available from: http://dx.doi.org/10.1117/12.907028. The published version is reproduced in accordance with the copyright policy of the publisher. One print or electronic copy may be made for personal use only. Systematic electronic or print reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.

Full text

Peer reviewed