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Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.3/226963
- Title
- New photoresists for super-resolution photo-inhibition nanofabrication
- Author(s)
- Cao, Yaoyu; Gan, Zongsong; Jia, Baohua; Evans, Richard A.; Gu, Min
- Abstract
- Direct laser writing based on photoinhibited polymerization has met great challenges to produce three-dimensional structures of nano-scale feature size due to the properties of photoresist. We developed a photoresist of high photosensitivity to improve the fabrication resolution and introduced a two-photon photoinitiator into the photoresist to implement photoinhibited polymerization in two-photon fabrication. Consequently, we realised dots of 40 nm in diameter and lines of 130 nm in width through single-photon polymerization and achieved effective photoinhibited polymerisation in the two-photon process.
- Publication type
- Conference paper
- Research centre
- Swinburne University of Technology. Faculty of Engineering and Industrial Sciences. Centre for Micro-Photonics. Centre for Ultrahigh bandwidth Devices for Optical Systems
- Source
- Proceedings of the International Quantum Electronics Conference and Conference on Lasers and Electro-Optics (Pacific Rim IQEC/CLEO 2011) incorporating the Australasian Conference on Optics, Lasers and Spectroscopy (ACOLS) and the Australian Conference on Optical Fibre Technology (ACOFT), Sydney, New South Wales, Australia, 28 August - 01 September 2011, pp. 578-579
- Publication year
- 2011
- Keyword(s)
- Direct laser writing; Nanofabrication; Photoinhibited polymerization; Photoresists; Two-photon photoinitiator
- Publisher
- Australian Optical Society, Australian Institute of Physics and Engineers Australia
- ISBN
- 9780977565771, 0977565777
- Publisher URL
- http://dx.doi.org/10.1109/IQEC-CLEO.2011.6194019
- Copyright
- Copyright © 2011 AOS.
- Peer reviewed
