Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements

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0206 Quantum Physics | 0906 Electrical and Electronic Engineering

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Title: Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements
Author(s): Loch, R. A.; Dubrouil, A.; Sobierajski, R.; Descamps, D.; Fabre, B.; Lidon, P.; van de Kruijs, R. W. E.; Boekhout, F.; Gullikson, E.; Gaudin, J.; Louis, E.; Bijkerk, F.; Mevel, E.; Petit, S.; Constant, E.; Mairesse, Y.
Abstract: We characterize the phase shift induced by reflection on a multilayer mirror in the extreme UV range (80-93 eV) using two techniques: one based on high order harmonic generation and attosecond metrology (reconstruction of attosecond beating by interference of two-photon transitions), and a second based on synchrotron radiation and measurements of standing waves (total electron yield). We find an excellent agreement between the results from the two measurements and a flat group delay shift (+/-40 as) over the main reflectivity peak of the mirror.
Publication type: Journal article
Source: Optics Letters, Vol. 36, no. 17 (Sep 2011), pp. 3386-3388
Publication year: 2011
FOR Code(s): 0205 Optical Physics; 0206 Quantum Physics; 0906 Electrical and Electronic Engineering
Keyword(s): Attosecond metrology; Elastic waves; Extreme UV; Flat group delay; High order harmonic generation; Multi-layer mirrors; Phase characterization; Standing wave measurements; Total electron yield; Two-photon transitions; Waves
Publisher: Optical Society of America
ISSN: 0146-9592
Publisher URL: http://dx.doi.org/10.1364/ol.36.003386
Peer reviewed