Home List of Titles Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements
Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.3/231175
- Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements
- Loch, R. A.; Dubrouil, A.; Sobierajski, R.; Descamps, D.; Fabre, B.; Lidon, P.; van de Kruijs, R. W. E.; Boekhout, F.; Gullikson, E.; Gaudin, J.; Louis, E.; Bijkerk, F.; Mevel, E.; Petit, S.; Constant, E.; Mairesse, Y.
- We characterize the phase shift induced by reflection on a multilayer mirror in the extreme UV range (80-93 eV) using two techniques: one based on high order harmonic generation and attosecond metrology (reconstruction of attosecond beating by interference of two-photon transitions), and a second based on synchrotron radiation and measurements of standing waves (total electron yield). We find an excellent agreement between the results from the two measurements and a flat group delay shift (+/-40 as) over the main reflectivity peak of the mirror.
- Publication type
- Journal article
- Optics Letters, Vol. 36, no. 17 (Sep 2011), pp. 3386-3388
- Publication year
- FOR Code(s)
- 0205 Optical Physics; 0206 Quantum Physics; 0906 Electrical and Electronic Engineering
- Attosecond metrology; Elastic waves; Extreme UV; Flat group delay; High order harmonic generation; Multi-layer mirrors; Phase characterization; Standing wave measurements; Total electron yield; Two-photon transitions; Waves
- Optical Society of America
- Publisher URL
- Copyright © 2011 Optical Society of America.
- Peer reviewed