Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.3/231614

Title

Ion beam analysis of nanoporous surfaces produced by He-implantation and oxidised by plasma-immersion ion-implantation

Author(s)

Markwitz, A.;  Johnson, P. B.;  Gilberd, P. W.;  Collins, G. A.;  Cohen, D. D.;  Dytlewski, N.

Abstract

Helium ion implantation into metals can lead to ordered bubble structures that develop into nanoporous cavity structures at high dose levels. Such cavity structures, and the oxides that can be formed on them, have been investigated previously for materials implanted using ion accelerators. These materials have unique features that offer potential for applications. Here, we investigate pulsed plasma-immersion ion-implantation (PI³ ) as a means of forming nanoporous oxide surfaces on a larger scale. 40 keV helium, and 20 keV oxygen, is implanted into Ti metal and two Ti alloys (including Ti-6Al-4V), and NRA, RBS, HERDA, TEM and Raman spectroscopy are used to characterise the resulting cavity structure and surface oxides. He implantation at a temperature of 160 degrees Celsius produces cavities approx. 2 nm across, in close-packed, apparently random structures. Oxygen implantation into substrates that are not pre-implanted with He, causes significant formation of TiO2 (rutile). Pre-implantation with He causes an increase in the amount of oxide and in the proportion of oxide that is amorphous.

Publication type

Journal article

Source

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms: incorporating the proceedings of the 14th International Conference on Ion Beam Analysis and the 6th European Conference on Accelerators in Applied Research and Technology, Dresden, Germany, 26-30 July 1999, Vol. 161, no. (Mar 2000), pp. 1048-1053

Publication year

2000

FOR Code(s)

0202 Atomic, Molecular, Nuclear, Particle and Plasma Physics;  0402 Geochemistry;  0915 Interdisciplinary Engineering

Keyword(s)

Beam plasma interactions;  Dosimetry;  Ion accelerators;  Ion implantation;  Nanostructured materials;  Particle accelerators;  Plasma immersion;  Porous materials;  Raman spectroscopy;  Rutherford backscattering spectroscopy;  Titanium compounds;  Transmission electron microscopy

Publisher

Elsevier

ISSN

0168-583X

Publisher URL

http://dx.doi.org/10.1016/s0168-583x(99)00679-5

Copyright

Copyright © 2000 Elsevier Science B.V. All rights reserved.

Additional information

Supported by the Australian Institute of Nuclear Science and Engineering (AINSE).

Peer reviewed