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Oxygen and hydrogen profiles in metal surfaces following plasma immersion ion implantation of helium
List of Titles
Oxygen and hydrogen profiles in metal surfaces following plasma immersion ion implantation of helium
Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.3/231626
- Title
- Oxygen and hydrogen profiles in metal surfaces following plasma immersion ion implantation of helium
- Author(s)
- Johnson, P. B.; Gilberd, P. W.; Markwitz, A.; Trompetter, W. J.; Collins, G. A.; Short, K. T.; Cohen, D. D.; Dytlewski, N.
- Abstract
- Helium ion implantation into metals can be used to form nanoscale cavities in high concentration in the surface. These cavity structures have unique features which offer potential for applications such as catalysis. Most previous studies have used ion accelerators to carry out the helium implantations. Here helium implantation using pulsed plasma immersion ion implantation (PI3 TM) is investigated. Previously we have reported results for PI3 implantations of 40-keV helium, and 20-keV oxygen, into Ti metal and two Ti alloys (including Ti-6Al-4V). Here we extend this work and examine in detail the depth profiles, determined by HERDA, of helium, hydrogen and oxygen in these metals following implantations of helium only, at several helium dose levels and two helium energies. It is found that the profiles for casual hydrogen and oxygen are strongly influenced by the depth profile and fluence of the implanted helium. The effect on the profiles of subsequent PI3 oxygen implantation is also reported.
- Publication type
- Journal article
- Source
- Surface and Coatings Technology: incorporating the proceedings of the 5th International Conference on Plasma-Based Ion Implantation, Kyoto, Japan, 13-16 December 1999 / I. Yamada, K. Yukimura and Y. Horino (eds.), Vol. 136, no. 1-3 (Feb 2001), pp. 217-222
- Publication year
- 2001
- FOR Code(s)
- 0204 Condensed Matter Physics; 0306 Physical Chemistry (Incl. Structural); 0912 Materials Engineering
- Keyword(s)
- Helium; Hydrogen; Ion implantation; Oxygen; PIII; Plasma applications; Plasma immersion ion implantation; Titanium oxides
- Publisher
- Elsevier
- ISSN
- 0257-8972
- Publisher URL
- http://dx.doi.org/10.1016/s0257-8972(00)01059-8
- Copyright
- Copyright © 2001 Elsevier Science BV.
- Additional information
- Supported by the Australian Institute of Nuclear Science and Engineering (AINSE).
- Peer reviewed


