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Home List of Titles Plasma processing for surface modification of trivalent chromium as alternative to hexavalent chromium layer
Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.3/245976
- Plasma processing for surface modification of trivalent chromium as alternative to hexavalent chromium layer
- Kwon, Sik-Choi; Lee, Hak-Jun; Kim, Jong-Kuk; Byon, Eungsun; Collins, George; Short, Ken
- Plasma source ion implantation (PSII) treatment was undertaken to improve the mechanical properties of electrodeposited trivalent chromium layers. Nitrogen ions were implanted, with energies of - 15 to - 25 keV and doses of 1, 5 and 10 x 10^17 atoms cm^-2, to modify the surface properties of Cr plating layer. The surface properties of the films were characterized by XRD, SEM, ruby-ball on disk type tribometer and nanoindenter. Polycrystalline CrN films with (200), (220) and (222) orientations were preferentially grown and numbers of surface cracks were increased by N+-PSII onto trivalent chromium layers. The surface hardness of the Cr3+ plating layer was increased from 16 to 25 GPa by N+-PSII. Severe wear and higher friction was observed on N+-PSII treated trivalent Cr plating. It seemed that the wear debris from hardened and cracked surface of the N+-PSII treated specimen prompted abrasive wear in the wear test. Roughness of the Cr3+ plating layers was smoothed with increasing implantation doses.
- Publication type
- Journal article
- Surface and Coatings Technology, Vol. 201, no. 15 (Apr 2007), pp. 6601-6605
- Publication year
- FOR Code(s)
- 0204 Condensed Matter Physics; 0306 Physical Chemistry (Incl. Structural); 0912 Materials Engineering
- Abrasion; Characterization; Chromium; Cracks; Crystal orientation; Electrodeposition; Hardness; Hexavalent chromium layer; Ion implantation; Mechanical properties; Nitrogen ion implantation; Plasma source ion implantation; Plasma sources; Scanning electron microscopy; Surface cracks; Surface hardness; Surface properties; Surface treatment; Trivalent chromium; X ray diffraction analysis
- Publisher URL
- Copyright © 2006 Elsevier B.V. All rights reserved.
- Peer reviewed