Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.3/231637

Title

Characteristics of the Ti2N layer produced by an ion assisted deposition method

Author(s)

Ruset, C.;  Grigore, E.;  Collins, G. A.;  Short, K. T.;  Rossi, F.;  Gibson, N.;  Dong, H.;  Bell, T.

Abstract

An ion assisted deposition process (CMSII) has been developed by combining high-energy ion bombardment, produced by a high voltage pulse discharge, with conventional magnetron sputtering. Since the ion bombardment occurs simultaneously with deposition, the implanted ions are uniformly distributed within the coating. Hard Ti₂N layers with an extremely dense, featureless structure and a thickness up to 50 μm have been produced. Instrumented indentation, XRD, SEM, GDOS have been used to characterize these layers, deposited on various substrates. Wear tests have been carried out in order to assess the tribological properties of this type of coating, in comparison with other surface layers.

Publication type

Journal article

Source

Surface and Coatings Technology: incorporating the proceedings of the 8th International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, 09-13 September 2002 / G. Brauer, D. Cameron, K.-T. Rie, K. Bewilogua, C. Oehr, K. Reichel, A. Ricard and R. Suchentrunk (eds.), Vol. 174-175 (Sep-Oct 2003), pp. 698-703

Publication year

2003

FOR Code(s)

0204 Condensed Matter Physics;  0306 Physical Chemistry (Incl. Structural);  0912 Materials Engineering

Keyword(s)

Electric discharges;  Indentation;  Instrumented indentation;  Ion beam assisted deposition;  Ion bombardment;  Ion implantation;  Magnetron sputtering;  Plasma;  Scanning electron microscopy;  Stress analysis;  Tribology;  Voltage discharges;  X ray diffraction analysis

Publisher

Elsevier

ISSN

0257-8972

Publisher URL

http://dx.doi.org/10.1016/s0257-8972(03)00411-0

Copyright

Copyright © 2003 Elsevier Science B.V. All rights reserved.

Peer reviewed