A comparison of plasma immersion ion implantation with conventional ion implantation

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Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.3/231703

Title: A comparison of plasma immersion ion implantation with conventional ion implantation
Author(s): Kenny, M. J.; Wielunski, L. S.; Tendys, J.; Collins, G. A.
Abstract: Plasma immersion ion implantation has a potential advantage over conventional line-of-sight ion implantation in being able to provide a uniform dose over a nonplanar surface. Operating regimes are different for each process leading to different surface modification characteristics. Comparisons have been made of the two techniques for mild steel, tungsten carbide and graphitic carbons. For nitrogen implanted mild steel, the PI to the power of three process gives a nitrogen depth distribution at least an order of magnitude greater than in CI squared. In graphitic carbons, CI squared is more effective in producing radiation damage and improving resistance to wear.
Publication type: Journal article
Source: Nuclear Instruments and Methods in Physics Research B: Beam Interactions with Materials and Atoms, Vol. 80-81, part 1 (Jun 1993), pp. 262-266
Publication year: 1993
FOR Code(s): 0202 Atomic, Molecular, Nuclear, Particle and Plasma Physics; 0402 Geochemistry; 0915 Interdisciplinary Engineering
Keyword(s): Nitrogen implantation; PIII; Plasma Immersion ion implantation
Publisher: Elsevier
ISSN: 0168-583X
Publisher URL: http://dx.doi.org/10.1016/0168-583X(93)96120-2
Peer reviewed