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Title

Femtosecond fabricated photomasks for fabrication of microfluidic devices

Author(s)

Day, Daniel;  Gu, Min

Abstract

This paper describes the direct write laser fabrication of a photolithography mask for prototyping of microfluidic devices in polydimethylsiloxane. An amplified femtosecond pulse laser is used to selectively remove the aluminium metal layer from the poly(methyl methacrylate) photomask substrate. The use of a femtosecond pulse laser to selectively etch a metal layer has several advantages over other conventional methods for binary photomask fabrication, namely rapid prototyping of microfluidic devices using soft lightography. Control of the energy density and defocus position of the focusing objective lens results in the etching of features with widths ranging from 2 µm to 35 µm when using an objective lens with a numerical aperture of 0.25.

Publication type

Journal article

Research centre

Swinburne University of Technology. Faculty of Engineering and Industrial Sciences. Centre for Micro-Photonics

Source

Optics Express, Vol. 14, no. 22 (2006), p. 10753-10758

Publication year

2006

Publisher

Optical Society of America

ISSN

1094-4087

Publisher URL

http://dx.doi.org/10.1364/OE.14.010753

Copyright

Copyright © 2006 Optical Society of America. Published version of the paper reproduced here in accordance with the copyright policy of the publisher. This paper was published in Optics Express and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://dx.doi.org/10.1364/OE.14.010753. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.

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